electrochemical etching meaning in English
电化浸蚀
电化蚀刻
电化学侵蚀
Examples
- In the third chapter porous silicon was prepared by pulsed and dc electrochemical etching methods under the equivalent etching condition
第三章研究了用脉冲电化学腐蚀制备均匀发光多孔硅。 - Circulating device is needed in electrochemical etching course . the consequences are benefit to silicon electrochemical micromachining technology and the technology will be hopeful to become an new technology about silicon deep - holes etching technology
其结果对进一步开展这方面的研究工作具有指导意义，在进一步深入开展研究电化学体硅微加工技术时，可有望成为实现硅深孔列阵加工的新技术。 - The sem and the pl observation showed that the surface of porous silicon prepared by pulsed etching was more uniform and the si particles were smaller . the intensity of pl formed by pulsed etching method was enhanced and the peak had blue shift comparing that formed by dc electrochemical etching method . at the same time , it was observed that the smaller the dimension of the porous silicon , the broader energy gap of the porous silicon
采用脉冲和直流电化学腐蚀两种方法制备多孔硅，对这两种方法制备的多孔硅样品进行扫描电镜和荧光光谱的测量，发现脉冲腐蚀制备的多孔硅样品比直流腐蚀制备的多孔硅样品表面均匀、颗粒尺寸小、发光强度大，而且发光峰位有明显的蓝移现象。 - The silicon plates are formed reverse four wimble array in koh solution by wet - etching technology . then the electrochemical etching experiments are done in three poles electrobath . and some technology questions such as heat oxygenation , light etching , wet etching and electrochemical etching have been analyzed . at the same time sample appearances are analyzed by scanning electron microscope . according to current burst model theory , the electrochemical deep holes etching mechanism are analyzed
在三极电解槽中，进行了电化学深刻蚀的探索性实验。对氧化、光刻、湿法刻蚀和电化学刻蚀中的工艺问题进行了初步的理论和实验研究，同时，采用sem对实验样品进行了形貌分析，并采用电流突破模型对电化学深孔刻蚀机理进行了理论分析。 - A large number of attempt and painstaking experiment have been done in this paper according to existing project . we also do lots of chemical and electrochemical etching research in material of lab6 , and find out three kind of methods to produce the field emitting cold cathode including reactive ion etching ( rie ) with oxygen , wet process etching and electrochemical etching . through produce some field emitting cold cathode single tip including lab6 field emitting cold cathode , molybdenum field emitting cold cathode , tungsten field emitting cold cathode , tungsten rhenium field emitting cold cathode , molybdenum covered with lab6 film field emitting cold cathode
而且,目前可借鉴的参考文献较少,围绕着前人做过的方案,本文做了大量工作,在已有文献介绍的基础上,结合原有的理论和实践基础,摸索出了包括高温氧作用反应离子( rie )刻蚀法、湿法腐蚀法和电化学腐蚀法在内的三种制备工艺,运用电化学腐蚀工艺成功制备了单尖的六硼化镧场发射冷阴极尖锥、钼场发射冷阴极尖锥、钨场发射冷阴极尖锥、钨铼合金场发射冷阴极尖锥以及有六硼化镧薄膜覆盖的钼场发射冷阴极尖锥。
Related Words
- electrochemical breakdown
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